Growth of niobium nitrate thin films on porous metallic substrates

Reference Presenter Authors
06-165 Natália Freitas Daudt Daudt, N.F.(Universidade Federal de Santa Maria); Pereira, J.F.(Universidade Federal de Santa Maria); Dorneles, L.S.(Universidade Federal de Santa Maria); Schneider, A.D.(Universidade Federal de Santa Maria); Matzenbacher, H.(Universidade Federal de Santa Maria); Schelp, L.F.(Universidade Federal de Santa Maria); The results of the growth of niobium nitride thin films on porous titanium and iron substrates by DC reactive sputtering will be presented in the conference. The porous substrates were produced by tape casting followed by conventional sintering or by pressing followed by plasma assisted sintering. Substrates with different grain sizes and porosity varying from 30 to 35 Vol% were applied. Thin film deposition was performed under nitrogen atmosphere using niobium target with 99.9% purity. The metallic substrates were heated up to 500 ºC, 700 ºC and 1000ºC during deposition. By adjusting dwelling time, film thickness could be controlled. Niobium nitride films with different stoichiometry and morphology were obtained. The effect of the substrate composition and morphology on the microstructure of the niobium nitride film will be presented. Furthermore, the effect of substrate temperature on the phase composition of the grown films investigated by Grazing Incidence X-Ray Diffraction as well as the film morphology analyzed by Scanning Electron Microscopy will be presented. Surface area will be analyzed by Brunauer-Emmett-Teller (BET) Surface Analysis and the results may be present as well. These structures have potential to be applied as ceramic supports for Proton Exchange Membranes Fuel Cells. Therefore, the effect of films morphology in the electrochemical properties will be investigated as an ongoing of this study.
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